EITRE Large Substrate

Overview:

• The EITRE Large Substrate system is a semi-automated nano-imprint lithography (NIL) tool designed for very large substrate areas—up to 500 × 500 mm.

• It enables high-accuracy pattern replication down to sub-50 nm resolutions, even across very large surface areas.

• This tool supports multiple imprint processes including thermal NIL, UV-NIL and the patent-protected “Simultaneous Thermal & UV (STU®)” process for enhanced material flexibility.

Key Features:

• Incorporates the proprietary SoftPress® technology which uses compressed gas to apply uniform pressure across large substrates, compensating for substrate bow or thickness variation to ensure a consistent residual layer.

• Supports automated handling of the Intermediate Polymer Stamp (IPS®) and demoulding to raise stamp lifetime and reduce contamination risks.

• Designed for both R&D and pilot production in industries where large-area nano patterns are required — such as displays, micro-LEDs, optics/photonic devices, solar cells and more.

Why it matters:
Large-area nanoimprint lithography presents significant engineering challenges (uniform pressure, fine resolution, large substrate handling). This system from Obducat helps bridge the gap between lab-scale and industrial scale by enabling large substrate sizes with high precision and repeatability.