SINDRE Integra

Overview

SINDRE® Integra is a fully automated nanoimprint lithography (NIL) tool designed for high-volume manufacturing (HVM). Its engineering targets industries requiring high throughput, high precision, and repeatable results.

Key Features

• Throughput of up to ~70 wafers per hour (WPH) depending on configuration.

• Supports imprint sizes up to 12″ wafers (or equivalent) for larger substrate formats.

• Achieves sub-50 nm resolution and excellent control of critical dimensions, making it suitable for advanced micro- and nanostructuring.

• Equipped with features such as in-line CVD anti-stick treatment of the intermediate polymer stamp (IPS®), in-line IPS® resist coating, and the patented SoftPress® technology for uniform imprint pressure and high fidelity.

• Engineered for low maintenance, high uptime and competitive cost-of-ownership (CoO) in HVM contexts.

Application Areas

The SINDRE® Integra is targeted at industries where high volume and high precision imprint lithography is required, such as:

• Optics & photonics (e.g., AR waveguides)

• LEDs and display devices

• MEMS and sensor manufacturing

• Bio- and medical devices

Why It Matters

By combining full automation, high throughput, and nanometer-scale resolution, SINDRE® Integra enables manufacturers to move from prototyping to production with NIL technology — bridging the gap between research tools and true industrial scale. It’s a key enabler in scaling nanoimprint processes for cost-effective manufacturing.