EITRE 3/6/8: Nanoimprint Lithography, NIL

Overview:

• The EITRE 3/6/8 systems are semi-automated nano-imprint lithography (NIL) tools designed for research & development, offering affordable access to micro- and nano-pattern replication.

• They support substrate sizes up to ~8″ × 8″, making them suitable for a broad range of R&D applications.

Key features:

• Embedded proprietary SoftPress® pressure-technology for uniform imprinting across the substrate, improving layer uniformity and pattern fidelity.

• Versatility in process options: supports thermal NIL, UV NIL, and a combined process called STU® (Simultaneous Thermal & UV) for wider material compatibility and faster cycle times.

• Highly configurable with optional features like optical alignment, water cooling, and various imprint modules to match different R&D needs.

Applications:

• Ideal for R&D in fields such as photonics, LEDs, MEMS/NEMS, sensors, biomedical devices and lab-on-chip systems where fine micro-/nano-structures are required.

• Enables academic and industrial labs to prototype and experiment with nano-scale patterning without resorting to full high-volume manufacturing equipment.

In summary the EITRE 3/6/8 line provides a flexible, capable entry point into cutting-edge imprint lithography for research environments, balancing cost, capability and adaptability.