Film and glass photomasks

Selba S.A. is a manufacturer of photomasks for photolithography, based in Geneva, Switzerland. We produce both glass and film photomasks, covering the full range from rapid prototyping to volume production.

Glass photomasks are made on sodalime or quartz (fused silica) substrates with low-reflective chrome coating, resolving features down to 0.6µm. Quartz versions support deep-UV exposure. Sizes run from 3×3 inches up to 28×32 inches, with custom sizes on request. These are the reference solution where dimensional stability and long-term accuracy matter: semiconductors, micro-optics, MEMS.

Film photomasks use silver halide emulsion on 180µm polyester, photoplotted at up to 50,800 dpi, resolving 7µm lines and 12µm circles, in sizes up to 28×32 inches. They are the cost-effective option for fast prototyping and iteration, used across PCB, semiconductors, MEMS and microfluidics — and we ship them within 24 hours of order confirmation.

Both types accept GDS, CIF, DXF and Gerber 274X input, and we handle custom sizes and specifications on request. Our team reviews every file before production to catch design issues early.

Selba has manufactured precision glass components since 1948. Photolithography and glass machining sit under one roof in Versoix, which means no handoffs between subcontractors and tight control over tolerances from artwork to finished part. We also work with encoder discs, optical linear scales, calibration plates and fine glass machining down to 0.1mm thickness.

Come talk to our engineers at Micro Nano Event 2026 in Besançon — bring your CAD files or just a concept.